Lithography for semiconductor manufacturing : 19-21 May, 1999, Edinburgh, Scotland

Lithography for semiconductor manufacturing : 19-21 May, 1999, Edinburgh, Scotland /

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Bibliographic Details
Corporate Authors: European Optical Society, Society of Photo-Optical Instrumentation Engineers, European Commission. Directorate-General XII, Science, Research, and Development, Scottish Enterprise, Sira Technology Centre (U.K.), Institution of Electrical Engineers
Other Authors: Mack, Chris A., Stevenson, Tom
Format: Book
Language:English
Published: Bellingham, Wash., USA : SPIE, [1999]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3741.
Europto series.
Subjects:
Integrated circuits > Very large scale integration > Congresses.
Printed circuits > Congresses.
Lithography > Congresses.
Integrated circuits > Very large scale integration.
Integrated circuits.
Printed circuits.
Lithography.
Conference papers and proceedings.
Description
Physical Description:vii, 262 pages : illustrations ; 28 cm.
Bibliography:Includes bibliographic references and author index.
ISBN:0819432210

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