Optical microlithography XII : 17-19 March, 1999, Santa Clara, California

Optical microlithography XII : 17-19 March, 1999, Santa Clara, California /

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Bibliographic Details
Corporate Authors: Society of Photo-Optical Instrumentation Engineers, Semiconductor Equipment and Materials International
Other Authors: Van den Hove, Luc
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE, [1999]
Series:Proceedings of SPIE--the International Society for Optical Engineering ; v. 3679.
Subjects:
Integrated circuits > Masks > Congresses.
Microlithography > Congresses.
X-ray lithography > Congresses.
Manufacturing processes > Congresses.
Integrated circuits > Masks.
Integrated circuits.
Microlithography.
X-ray lithography.
Manufacturing processes.
Conference papers and proceedings.
Description
Physical Description:2 volumes (xvi, 1,182 pages) : illustrations ; 28 cm.
Bibliography:Includes bibliographical references and author index.
ISBN:0819431532

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