Ultrathin SiO₂ and high-K materials for ULSI gate dielectrics : symposium held April 5-8, 1999, San Francisco, California, U.S.A. /
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Other Authors: | |
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Format: | Book |
Language: | English |
Published: |
Warrendale, PA :
Materials Research Society,
1999.
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Series: | Materials Research Society symposia proceedings ;
v. 567. |
Subjects: |
University Library ARS Main Stacks
Call Number: |
TK7874.76 .U48 1999
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Copy 1 | Available Request this item |