64- to 256-megabit reticle generation : technology requirements and approaches

64- to 256-megabit reticle generation : technology requirements and approaches /

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Bibliographic Details
Corporate Authors: BACUS (Technical group), Society of Photo-Optical Instrumentation Engineers
Other Authors: Hearn, Gregory K.
Format: Book
Language:English
Published: Bellingham, Wash. : SPIE Optical Engineering Press, [1994]
Series:Critical reviews of optical science and technology ; v. CR51.
Subjects:
Integrated circuits > Masks > Congresses.
Reticles > Congresses.
Microlithography > Congresses.
Semiconductor storage devices > Design and construction > Congresses.
Integrated circuits > Masks.
Integrated circuits.
Reticles.
Microlithography.
Semiconductor storage devices > Design and construction.
Semiconductor storage devices.
Conference papers and proceedings.

University Library ARS Main Stacks

Holdings details from University Library ARS Main Stacks
Call Number: TK7874 .A13 1994
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